Search Results (20)

ZnO thin films were deposited using RF sputtering by varying the argon:oxygen gas flow rates and substrate temperatures. Structural, optical and electrical characterization of ZnO thin films were systematically carried out using X-Ray diffraction (XRD), scanning electron microscopy (SEM), UV–visible spectroscopy, X-Ray photoelectron spectroscopy (XPS) and Hall measurements. Film deposited at room temperature and annealed at 300 °C exhibited low O₂ incorporation with localized defects and a high percentage of Zn interstitials. A large crystalline size and fewer grain boundaries resulted in a high Hall mobility of 46.09 cm²/V-s Deposition at higher substrate temperatures resulted in improvement in O₂ incorporation through the annihilation of localized defects and decrease in oxygen vacancies and Zn interstitials. Urbach tails within the bandgap were identified using the absorption spectrum and compared with the % defects from XPS. Bottom-gate thin-film transistors were subsequently fabricated on a SiO₂/p-Si substrate using the combination of RF sputtering, wet etching and photolithography. Variation in the substrate temperature showed performance enhancement in terms of the leakage current, threshold voltage, sub-threshold swing and I_ON/I_OFF ratio. Thin-film transistor (TFT) devices deposited at 300 °C resulted in an O₂-rich surface through chemisorption, which led to a reduction in the leakage current of up to 10⁻¹² A and a 10-fold reduction in the sub-threshold swing (SS) from 30 V to 2.8 V. Further TFT optimization was carried out by reducing the ZnO thickness to 50 nm, which resulted in a field-effect mobility of 1.1 cm²/V-s and I_ON/I_OFF ratio of 10⁵. Full article

Perfluorododecyl iodide (I-PFC12) is of interest for area-selective deposition (ASD) applications as it exhibits intriguing properties such as ultralow surface energy, the ability to modify silicon’s band gap, low surface friction, and suitability for micro-contact patterning. Traditional photolithography is struggling to reach the required critical dimensions. This study investigates the potential of using I-PFC12 as a way to produce contrast between the growth area and non-growth areas of a surface subsequent to extreme ultraviolet (EUV) exposure. Once exposed to EUV, the I-PFC12 molecule should degrade with the help of the photocatalytic substrate, allowing for the subsequent selective deposition of the hard mask. The stability of a vapor-deposited I-PFC12 self-assembled monolayer (SAM) was examined when exposed to ambient light for extended periods of time by using X-ray photoelectron spectroscopy (XPS). Two substrates, SiO₂ and TiO₂, are investigated to ascertain the suitability of using TiO₂ as a photocatalytic active substrate. Following one month of exposure to light, the atomic concentrations showed a more substantial fluorine loss of 10.2% on the TiO₂ in comparison to a 6.2% loss on the SiO₂ substrate. This more pronounced defluorination seen on the TiO₂ is attributed to its photocatalytic nature. Interestingly, different routes to degradation were observed for each substrate. Reference samples preserved in dark conditions with no light exposure for up to three months show little degradation on the SiO₂ substrate, while no change is observed on the TiO₂ substrate. The results reveal that the I-PFC12 SAM is an ideal candidate for resistless EUV lithography. Full article

Piezoelectric thin films are extensively used as sensing or actuating layers in various micro-electromechanical systems (MEMS) applications. However, most piezoelectrics are stiff ceramics, and current polymer piezoelectrics are not compatible with microfabrication due to their low Curie Temperature. Recent polymer-composite piezoelectrics have gained interest but can be difficult to pattern. Photodefinable piezoelectric films could resolve these challenges by reducing the manufacturability steps by eliminating the etching process. But they typically have poor resolution and thickness properties. This study explores methods of enhancing the manufacturability of piezoelectric composite films by optimizing the process parameters and synthesis of SU-8 piezo-composite materials. Piezoelectric ceramic powders (barium titanate (BTO) and lead zirconate titanate (PZT)) were integrated into SU-8, a negative epoxy-based photoresist, to produce high-resolution composites in a non-cleanroom environment. I-line (365 nm) light was used to enhance resolution compared to broadband lithography. Two variations of SU-8 were prepared by thinning down SU-8 3050 and SU-8 3005. Different weight percentages of the piezoelectric powders were investigated: 5, 10, 15 and 20 wt.% along with varied photolithography processing parameters. The composites’ transmittance properties were characterized using UV-Vis spectroscopy and the films’ crystallinity was determined using X-ray diffraction (XRD). The 0–3 SU-8/piezo composites demonstrated resolutions < 2 μm while maintaining bulk piezoelectric coefficients d₃₃ > 5 pm V⁻¹. The films were developed with thicknesses >10 μm. Stacked layers were achieved and demonstrated significantly higher d₃₃ properties. Full article

We focused on polydimethylsiloxane (PDMS) as a substrate for replication, micropatterning, and construction of biologically active surfaces. The novelty of this study is based on the combination of the argon plasma exposure of a micropatterned PDMS scaffold, where the plasma served as a strong tool for subsequent grafting of collagen coatings and their application as cell growth scaffolds, where the standard was significantly exceeded. As part of the scaffold design, templates with a patterned microstructure of different dimensions (50 × 50, 50 × 20, and 30 × 30 μm²) were created by photolithography followed by pattern replication on a PDMS polymer substrate. Subsequently, the prepared microstructured PDMS replicas were coated with a type I collagen layer. The sample preparation was followed by the characterization of material surface properties using various analytical techniques, including scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS). To evaluate the biocompatibility of the produced samples, we conducted studies on the interactions between selected polymer replicas and micro- and nanostructures and mammalian cells. Specifically, we utilized mouse myoblasts (C2C12), and our results demonstrate that we achieved excellent cell alignment in conjunction with the development of a cytocompatible surface. Consequently, the outcomes of this research contribute to an enhanced comprehension of surface properties and interactions between structured polymers and mammalian cells. The use of periodic microstructures has the potential to advance the creation of novel materials and scaffolds in tissue engineering. These materials exhibit exceptional biocompatibility and possess the capacity to promote cell adhesion and growth. Full article

AlF₃ has interesting electrophysical properties, due to which the material is promising for applications in supercapacitors, UV coatings with low refractive index, excimer laser mirrors, and photolithography. The formation of AlF₃-based nano- and micro-wires can bring new functionalities to AlF₃ material. AlF₃ nanowires are used, for example, in functionally modified microprobes for a scanning probe microscope. In this work, we investigate the AlF₃ samples obtained by the reaction of initial aluminum with an aqueous hydrofluoric acid solution of different concentrations. The peculiarity of our work is that the presented method for the synthesis of AlF₃ and one-dimensional structures based on AlF₃ is simple to perform and does not require any additional precursors or costs related to the additional source materials. All the samples were obtained under normal conditions. The morphology of the nanowire samples is studied using scanning electron microscopy. We performed an intermediate atomic force microscope analysis of dissolved Al samples to analyze the reactions occurring on the metal surface. The surface of the obtained samples was analyzed using a scanning electron microscope. During the analysis, it was found that under the given conditions, whiskers were synthesized. The scale of one-dimensional structures varies depending on the given parameters in the system. Quantitative energy-dispersive x-ray spectroscopy spectra are obtained and analyzed with respect to the feedstock and each other. Full article

This study examines the electrical properties and layer quality of field emission microtriodes that have planar electrode geometry and are based on tungsten (W) and silicon dioxide (SiO₂). Two types of microtriodes were analyzed: one with a multi-tip cathode fabricated using photolithography (PL) and the other with a single-tip cathode fabricated using a focused ion beam (FIB). Atomic force microscopy (AFM) analysis revealed surface roughness of the W layer in the order of several nanometers (Ra = 3.8 ± 0.5 nm). The work function values of the Si substrate, SiO₂ layer, and W layer were estimated using low-energy ultraviolet photoelectron emission (PE) spectroscopy and were 4.71 eV, 4.85 eV, and 4.67 eV, respectively. The homogeneity of the W layer and the absence of oxygen and silicon impurities were confirmed via X-ray photoelectron spectroscopy (XPS). The PL microtriode and the FIB microtriode exhibited turn-on voltages of 110 V and 50 V, respectively, both demonstrating a field emission current of 0.4 nA. The FIB microtriode showed significantly improved field emission efficiency compared to the PL microtriode, attributed to a higher local electric field near the cathode. Full article

Micron- and submicron-scale 3D structure realization nowadays is possible due to the two-photon photopolymerization (TPP) direct laser writing photolithography (DLW photolithography) method. However, the achievement of lithographic features with dimensions less than 100 nm is in demand for the fabrication of micro-optical elements with high curvature values, including X-ray microlenses. Spectroscopic and photochemical study of a photoinitiator (PI) based on a methyl methacrylate derivative of 2,5-bis(4-(dimethylamino)benzylidene) cyclopentanone was performed. Enhanced intersystem crossing in the methyl methacrylate derivative results in increased radical generation for the subsequent initiation of polymerization. A comprehensive study of the new photocompositions was performed, with particular emphasis on photochemical constants, the degree of photopolymerization, and topology. The optimal parameters for the fabrication of mechanically stable structures were determined in this research. The threshold dose parameters for lithography (radiation power of 5 mW at a speed of 180 µm/s) when trying to reach saturation values with a conversion degree of (35 ± 1) % were defined, as well as parameters for sub-100 nm feature fabrication. Moreover, the 45 nm feature size for elements was reached. Fabrication of X-ray lens microstructures was also demonstrated. Full article

Vertically aligned carbon nanotubes (CNTs) are essential to studying high current density, low dispersion, and high brightness. Vertically aligned 14 × 14 CNT emitters are fabricated as an island by sputter coating, photolithography, and the plasma-enhanced chemical vapor deposition process. Scanning electron microscopy is used to analyze the morphology structures with an average height of 40 µm. The field emission microscopy image is captured on the microchannel plate (MCP). The role of the microchannel plate is to determine how the high-density electron beam spot is measured under the variation of voltage and exposure time. The MCP enhances the field emission current near the threshold voltage and protects the CNT from irreversible damage during the vacuum arc. The high-density electron beam spot is measured with an FWHM of 2.71 mm under the variation of the applied voltage and the exposure time, respectively, which corresponds to the real beam spot. This configuration produces the beam trajectory with low dispersion under the proper field emission, which could be applicable to high-resolution multi-beam electron microscopy and high-resolution X-ray imaging technology. Full article

In the frame of the nanoarchitectonic concept, the objective of this study was to develop simple and easy methods to ensure the preparation of polymorphic HfO₂ thin film materials (<200 nm) having the best balance of patterning potential, reproducibility and stability to be used in optical, sensing or electronic fields. The nanostructured HfO₂ thin films with micropatterns or continuous morphologies were synthesized by two different methods, i.e., the micropatterning of sol-gel solutions by deep ultraviolet (DUV) photolithography or the electrophoretic deposition (EPD) of HfO₂ nanoparticles (HfO_2-NPs). Amorphous and monoclinic HfO₂ micropatterned nanostructured thin films (HfO_2-DUV) were prepared by using a sol-gel solution precursor (HfO_2-SG) and spin-coating process following by DUV photolithography, whereas continuous and dense monoclinic HfO₂ nanostructured thin films (HfO_2-EPD) were prepared by the direct EPD of HfO_2-NPs. The HfO_2-NPs were prepared by a hydrothermal route and studied through the changing aging temperature, pH and reaction time parameters to produce nanocrystalline particles. Subsequently, based on the colloidal stability study, suspensions of the monoclinic HfO_2-NPs with morphologies near spherical, spindle- and rice-like shapes were used to prepare HfO_2-EPD thin films on conductive indium-tin oxide-coated glass substrates. Morphology, composition and crystallinity of the HfO_2-NPs and thin films were investigated by powder and grazing incidence X-ray diffraction, scanning electron microscopy, transmission electron microscopy and UV-visible spectrophotometry. The EPD and DUV photolithography performances were explored and, in this study, it was clearly demonstrated that these two complementary methods are suitable, simple and effective processes to prepare controllable and tunable HfO₂ nanostructures as with homogeneous, dense or micropatterned structures. Full article

The flexible, anti-fouling, and bionic surface-enhanced Raman scattering (SERS) biochip, which has a Nepenthes peristome-like structure, was fabricated by photolithography, replicated technology, and thermal evaporation. The pattern of the bionic Nepenthes peristome-like structure was fabricated by two layers of photolithography with SU-8 photoresist. The bionic structure was then replicated by polydimethylsiloxane (PDMS) and grafting the zwitterion polymers (2-methacryloyloxyethyl phosphorylcholine, MPC) by atmospheric plasma polymerization (PDMS-PMPC). The phospholipid monomer of MPC immobilization plays an important role; it can not only improve hydrophilicity, anti-fouling and anti-bacterial properties, and biocompatibility, but it also allows for self-driving and unidirectional water delivery. Ag nanofilms (5 nm) were deposited on a PDMS (PDMS-Ag) substrate by thermal evaporation for SERS detection. Characterizations of the bionic SERS chips were measured by a scanning electron microscope (SEM), optical microscope (OM), X-ray photoelectron spectrometer (XPS), Fourier-transform infrared spectroscopy (FTIR), and contact angle (CA) testing. The results show that the superior anti-fouling capability of proteins and bacteria (E. coli) was found on the PDMS-PMPC substrate. Furthermore, the one-way liquid transfer capability of the bionic SERS chip was successfully demonstrated, which provides for the ability to separate samples during the flow channel, and which was detected by Raman spectroscopy. The SERS intensity (adenine, 10⁻⁴ M) of PDMS-Ag with a bionic structure is ~4 times higher than PDMS-Ag without a bionic structure, due to the multi-reflection of the 3D bionic structure. The high-sensitivity bionic SERS substrate, with its self-driving water capability, has potential for biomolecule separation and detection. Full article

In this paper, we report on the synthesis—via the wet chemical precipitation route method—and thin film characteristics of inorganic semiconductor, cuprous oxide (Cu₂O) nanoparticles, for their potential application in enhancing the humidity-sensing properties of semiconducting polymer poly(9,9-dioctylfluorene) (F8). For morphological analysis of the synthesized Cu₂O nanoparticles, transmission electron microscope (TEM) and scanning electron microscope (SEM) micrographs are studied to investigate the texture, distribution, shape, and sizes of Cu₂O crystallites. The TEM image of the Cu₂O nanoparticles exhibits somewhat non-uniform distribution with almost uniform shape and size having an average particle size of ≈24 ± 2 nm. Fourier transformed infrared (FTIR) and X-ray diffraction (XRD) spectra are studied to validate the formation of Cu₂O nanoparticles. Additionally, atomic force microscopy (AFM) is performed to analyze the surface morphology of polymer-inorganic (F8-Cu₂O) nanocomposites thin film to see the grain sizes, mosaics, and average surface roughness. In order to study the enhancement in sensing properties of F8, a hybrid organic–inorganic (F8-Cu₂O) surface-type humidity sensor Ag/F8-Cu₂O/Ag is fabricated by employing F8 polymer as an active matrix layer and Cu₂O nanoparticles as a dopant. The Ag/F8-Cu₂O/Ag device is prepared by spin coating a 10:1 wt% solution of F8-Cu₂O nanocomposite on pre-patterned silver (Ag) electrodes on glass. The inter-electrode gap (≈5 μm) between Ag is developed by photolithography. To study humidity sensing, the Ag/F8-Cu₂O/Ag device is characterized by measuring its capacitance (C) as a function of relative humidity (%RH) at two different frequencies (120 Hz and 1 kHz). The device exhibits a broad humidity sensing range (27–86%RH) with shorter response time and recovery time, i.e., 9 s and 8 s, respectively. The present results show significant enhancement in the humidity-sensing properties as compared to our previously reported results of Ag/F8/Ag sensor wherein the humidity sensing range was 45–78%RH with 15 s and 7 s response and recovery times, respectively. The improvement in the humidity-sensing properties is attributed to the potential use of Cu₂O nanoparticles, which change the hydrophobicity, surface to volume ratio of Cu₂O nanoparticles, as well as modification in electron polarizability and polarity of the F8 matrix layer. Full article

It is crucial to develop novel metrology techniques in the semiconductor fabrication process to accurately measure a film’s thickness in a few nanometers, as well as the material profile of the film. Highly uniform trichlorosilane (1H,1H,2H,2H-perfluorodecyltrichlorosilane, FDTS) derived SAM film patterns were fabricated by several conventional semiconductor fabrication methods combined, including photolithography, SAM vapor deposition, and the lift-off technique. Substantial information can be collected for FDTS SAM film patterns when Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) techniques are incorporated to investigate this material. Precise two-dimensional (2D) FDTS SAM film patterns were reconstructed through mapping analysis of corresponding elements and chemical state peaks by AES and XPS. Additionally, three-dimensional (3D) FDTS SAM film patterns were also reconstructed layer by layer through gas cluster ion beam (GCIB) etching and XPS analysis. These characterization results demonstrate that FDTS SAM film patterns based on the vapor deposition method are highly uniform because the vacuum and precise gas-delivery system exclude ambient environmental interference efficiently and ensure reaction process repeatability. AES and XPS techniques could be used for metrology applications in the semiconductor process with high-quality SAM microstructures and nanostructures. Full article

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings. Full article

As a transdermal drug delivery technology, microneedle array (MNA) has the characteristics of painless, minimally invasive, and precise dosage. This work discusses and compares the new MNA mold prepared by our group using MEMS technology. First, we introduced the planar pattern-to-cross-section technology (PCT) method using LIGA (Photolithography, Galvanogormung, Abformung) technology to obtain a three-dimensional structure similar to an X-ray mask pattern. On this basis, combined with polydimethylsiloxane (PDMS) transfer technology and electroplating process, metal MNA can be prepared. The second method is to use silicon wet etching combined with the SU-8 process to obtain a PDMS quadrangular pyramid MNA using PDMS transfer technology. Third method is to use the tilting rotary lithography process to obtain PDMS conical MNA on SU-8 photoresist through PDMS transfer technology. All three processes utilize parallel subtractive manufacturing methods, and the error range of reproducibility and accuracy is 2–11%. LIGA technology produces hollow MNA with an aspect ratio of up to 30, which is used for blood extraction and drug injection. The height of the MNA prepared by the engraving process is about 600 μm, which can achieve a sustained release effect together with a potential systemic delivery. The height of the MNA prepared by the ultraviolet exposure process is about 150 μm, which is used to stimulate the subcutaneous tissue. Full article

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy. Full article