Yu, B.; Cong, H.; Yang, Z.; Yang, S.; Wang, Y.; Zhai, F.; Wang, Y.
Preparation of Humidity-Sensitive Poly(Ethylene Glycol) Inverse Opal Micropatterns Using Colloidal Lithography. Materials 2017, 10, 1035.
https://doi.org/10.3390/ma10091035
AMA Style
Yu B, Cong H, Yang Z, Yang S, Wang Y, Zhai F, Wang Y.
Preparation of Humidity-Sensitive Poly(Ethylene Glycol) Inverse Opal Micropatterns Using Colloidal Lithography. Materials. 2017; 10(9):1035.
https://doi.org/10.3390/ma10091035
Chicago/Turabian Style
Yu, Bing, Hailin Cong, Zhen Yang, Shujing Yang, Yuezhong Wang, Feng Zhai, and Yifan Wang.
2017. "Preparation of Humidity-Sensitive Poly(Ethylene Glycol) Inverse Opal Micropatterns Using Colloidal Lithography" Materials 10, no. 9: 1035.
https://doi.org/10.3390/ma10091035
APA Style
Yu, B., Cong, H., Yang, Z., Yang, S., Wang, Y., Zhai, F., & Wang, Y.
(2017). Preparation of Humidity-Sensitive Poly(Ethylene Glycol) Inverse Opal Micropatterns Using Colloidal Lithography. Materials, 10(9), 1035.
https://doi.org/10.3390/ma10091035