Li, J.; Qin, H.; Liu, Y.; Ye, F.; Li, Z.; Cheng, L.; Zhang, L.
Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment. Materials 2017, 10, 627.
https://doi.org/10.3390/ma10060627
AMA Style
Li J, Qin H, Liu Y, Ye F, Li Z, Cheng L, Zhang L.
Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment. Materials. 2017; 10(6):627.
https://doi.org/10.3390/ma10060627
Chicago/Turabian Style
Li, Jianping, Hailong Qin, Yongsheng Liu, Fang Ye, Zan Li, Laifei Cheng, and Litong Zhang.
2017. "Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment" Materials 10, no. 6: 627.
https://doi.org/10.3390/ma10060627
APA Style
Li, J., Qin, H., Liu, Y., Ye, F., Li, Z., Cheng, L., & Zhang, L.
(2017). Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment. Materials, 10(6), 627.
https://doi.org/10.3390/ma10060627