Roy, F.; Suler, A.; Dalleau, T.; Duru, R.; Benoit, D.; Arnaud, J.; Cazaux, Y.; Chaton, C.; Montes, L.; Morfouli, P.;
et al. Fully Depleted, Trench-Pinned Photo Gate for CMOS Image Sensor Applications. Sensors 2020, 20, 727.
https://doi.org/10.3390/s20030727
AMA Style
Roy F, Suler A, Dalleau T, Duru R, Benoit D, Arnaud J, Cazaux Y, Chaton C, Montes L, Morfouli P,
et al. Fully Depleted, Trench-Pinned Photo Gate for CMOS Image Sensor Applications. Sensors. 2020; 20(3):727.
https://doi.org/10.3390/s20030727
Chicago/Turabian Style
Roy, Francois, Andrej Suler, Thomas Dalleau, Romain Duru, Daniel Benoit, Jihane Arnaud, Yvon Cazaux, Catherine Chaton, Laurent Montes, Panagiota Morfouli,
and et al. 2020. "Fully Depleted, Trench-Pinned Photo Gate for CMOS Image Sensor Applications" Sensors 20, no. 3: 727.
https://doi.org/10.3390/s20030727
APA Style
Roy, F., Suler, A., Dalleau, T., Duru, R., Benoit, D., Arnaud, J., Cazaux, Y., Chaton, C., Montes, L., Morfouli, P., & Lu, G.-N.
(2020). Fully Depleted, Trench-Pinned Photo Gate for CMOS Image Sensor Applications. Sensors, 20(3), 727.
https://doi.org/10.3390/s20030727