Ren, F.-B.; Jiang, S.-C.; Hsu, C.-H.; Zhang, X.-Y.; Gao, P.; Wu, W.-Y.; Chiu, Y.-J.; Lien, S.-Y.; Zhu, W.-Z.
Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures. Molecules 2022, 27, 8123.
https://doi.org/10.3390/molecules27238123
AMA Style
Ren F-B, Jiang S-C, Hsu C-H, Zhang X-Y, Gao P, Wu W-Y, Chiu Y-J, Lien S-Y, Zhu W-Z.
Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures. Molecules. 2022; 27(23):8123.
https://doi.org/10.3390/molecules27238123
Chicago/Turabian Style
Ren, Fang-Bin, Shi-Cong Jiang, Chia-Hsun Hsu, Xiao-Ying Zhang, Peng Gao, Wan-Yu Wu, Yi-Jui Chiu, Shui-Yang Lien, and Wen-Zhang Zhu.
2022. "Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures" Molecules 27, no. 23: 8123.
https://doi.org/10.3390/molecules27238123
APA Style
Ren, F.-B., Jiang, S.-C., Hsu, C.-H., Zhang, X.-Y., Gao, P., Wu, W.-Y., Chiu, Y.-J., Lien, S.-Y., & Zhu, W.-Z.
(2022). Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures. Molecules, 27(23), 8123.
https://doi.org/10.3390/molecules27238123