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A Stereocontrolled Protocol to Highly Functionalized Fluorinated Scaffolds through a Fluoride Opening of Oxiranes
Open AccessArticle

Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability

National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, Magurele-Bucharest, Ilfov 077125, Romania
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Academic Editor: Bela Torok
Molecules 2016, 21(12), 1711; https://doi.org/10.3390/molecules21121711
Received: 6 October 2016 / Revised: 29 November 2016 / Accepted: 5 December 2016 / Published: 13 December 2016
(This article belongs to the Special Issue Fluorine Chemistry 2016)
Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved. View Full-Text
Keywords: plasma processing; fluorinated thin films; nanostructured surfaces; superhydrophobic surfaces plasma processing; fluorinated thin films; nanostructured surfaces; superhydrophobic surfaces
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MDPI and ACS Style

Satulu, V.; Ionita, M.D.; Vizireanu, S.; Mitu, B.; Dinescu, G. Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability. Molecules 2016, 21, 1711.

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