Search Results (6)

The high-efficiency polishing of large-sized polycrystalline diamond (PCD) wafers continues to pose significant challenges in its practical applications. Conventional mechanical polishing suffers from a low material removal rate (MRR) and surface damage. To improve the process efficiency, this study investigates the effect of chemomechanical abrasive polishing (CMAP) with a slurry containing high-concentration H₂O₂ and varying mass percentages of SiO₂ powder and diamond particles on surface morphology, surface roughness, material removal rate (MRR), and microstrain of PCD disks. The contributions of mechanical action, chemical action, and bubble cavitation to the CMAP process are analyzed. Scanning electron microscopy (SEM) observations indicate that large grains present in PCD are effectively eliminated after CMAP, leading to a notable reduction in surface roughness. The optimal results are obtained with 60 wt% SiO₂ powder and 40 wt% diamond particles, achieving a maximum MRR of 1039.78 μm/(MPa·h) (15.5% improvement compared to the mechanical method) and a minimum surface roughness (Sa) of 3.59 μm. Additionally, the microstrain on the PCD disk shows a slight reduction following the CMAP process. The material removal mechanism is primarily attributed to mechanical action (70.8%), with bubble cavitation and chemical action (27.5%) and action of SiO₂ (1.7%) playing secondary roles. The incorporation of SiO₂ leads to the formation of a lubricating layer, significantly reducing surface damage and decreasing the surface roughness Sa to 1.39 µm. Full article

Background: From one year to another, dentists have access to more procedures using modern techniques. Many of them can improve the effectiveness of dental procedures and frequently facilitate and accelerate them. Objectives: Technically advanced devices are an important part of modern dentistry. Over the years, there were developed technologies like ultrasounds, lasers, air abrasion, ozonotherapy, caries diagnostic methods, chemomechanical caries removal (CMCR), pulp vitality tests, computer-controlled local anesthetic delivery (CCLAD). The aim of this study was to investigate the requirement of Polish dentists for such technologies. Methods: An anonymous questionnaire was posted on a social media group of dentists from Poland. 187 responses were obtained. Results: It turned out that almost every respondent uses ultrasounds, but other technologies are not as popular. 43% use CCLAD, 33% use diagnostic methods, 28% use air abrasion, 25% use dental lasers, 21% use CMCR, 18% use pulp vitality tests and 6% use ozonotherapy. The most common reason for not using the aforementioned technologies were their high cost and the sufficient effectiveness of raditional methods. There was a correlation between use of a dental laser and CCLAD and size of office, CMCR use and dentists’ work time and air abrasion use and gender. Many dentists claim that they will try one of the modern technologies in the future. Conclusions: It can be concluded that Polish dentists tend to use ultrasounds and CCLAD more than any other technology. In the future this may change, so more studies in this topic are needed. Full article

Chemomechanical preparation of the root canal system is considered to be the most important part of root canal treatment, including both mechanical removal of tissue remnants and dentine chips, and chemical elimination of biofilm and microorganisms. A number of different solutions and agitation techniques have been proposed for that purpose. It was the aim of the present study to investigate whether root canal cleanliness can be improved by using a hydroxyapatite nanoparticle-containing solution with and without sonic or ultrasonic agitation. Seventy-four single-rooted teeth were divided into four experimental groups (n = 15) and two control groups (n = 7). All teeth were split longitudinally and a groove and three holes were cut into the root canal wall and filled with dentinal debris. Final irrigation was performed using sodium hypochlorite or a hydroxyapatite nanoparticle-containing solution (Vector polish) activated with a sonically or an ultrasonically driven endodontic file. Two calibrated investigators rated the remaining debris using a four-score scale. The results were analyzed using a non-parametric test with $\alpha$ < 0.05. Sonic and ultrasonic irrigation with sodium hypochlorite cleaned the grooves and holes well from debris. The hydroxyapatite nanoparticles activated by a sonic file cleaned grooves and holes equally well. Ultrasonically activated nanoparticles performance was clearly inferior. The syringe control-group left large amounts of debris in grooves and holes. The use of the hydroxyapatite nanoparticles used in this study did not improve removal of debris. Full article

We demonstrate the fabrication of single-mode optical waveguides on lithium niobate on an insulator (LNOI) by optical patterning combined with chemomechanical polishing. The fabricated LNOI waveguides had a nearly symmetric mode profile of ~2.5 µm mode field size (full-width at half-maximum). We developed a high-precision measurement approach by which single-mode waveguides were characterized to have propagation loss of ~0.042 dB/cm. Full article

We report the fabrication of crystalline microresonators of high quality (Q) factors with a controllable wedge angle on lithium niobate on insulator (LNOI). Our technique relies on a femtosecond laser assisted chemo-mechanical polish, which allows us to achieve ultrahigh surface smoothness as critically demanded by high Q microresonator applications. We show that by refining the polish parameters, Q factors as high as 4.7 × 10⁷ can be obtained and the wedge angle of the LNOI can be continuously tuned from 9° to 51°. Full article

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits. Full article