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Open AccessLetter

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

1
Deutsches Elektronen-Synchrotron (DESY), 22607 Hamburg, Germany
2
CNRS, Ecole Polytechique-IPP, ENSTA, Chemin de la Hunière, 91761 Palaiseau, France
3
Imagine Optic, 18 Rue Charles de Gaulle, 91400 Orsay, France
4
Center for Advanced Material Diagnostic Technology, Shenzhen Technology University, Shenzhen 518118, China
*
Author to whom correspondence should be addressed.
Sensors 2020, 20(22), 6426; https://doi.org/10.3390/s20226426
Received: 30 September 2020 / Revised: 3 November 2020 / Accepted: 7 November 2020 / Published: 10 November 2020
(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)
Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy. View Full-Text
Keywords: wavefront sensor; extreme ultraviolet; optical metrology; Schwarzschild objective wavefront sensor; extreme ultraviolet; optical metrology; Schwarzschild objective
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MDPI and ACS Style

Ruiz-Lopez, M.; Mehrjoo, M.; Keitel, B.; Plönjes, E.; Alj, D.; Dovillaire, G.; Li, L.; Zeitoun, P. Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy. Sensors 2020, 20, 6426. https://doi.org/10.3390/s20226426

AMA Style

Ruiz-Lopez M, Mehrjoo M, Keitel B, Plönjes E, Alj D, Dovillaire G, Li L, Zeitoun P. Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy. Sensors. 2020; 20(22):6426. https://doi.org/10.3390/s20226426

Chicago/Turabian Style

Ruiz-Lopez, Mabel; Mehrjoo, Masoud; Keitel, Barbara; Plönjes, Elke; Alj, Domenico; Dovillaire, Guillaume; Li, Lu; Zeitoun, Philippe. 2020. "Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy" Sensors 20, no. 22: 6426. https://doi.org/10.3390/s20226426

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