Article Versions Notes

Hayashi H, Hachikubo Y, Ando M, Oshima M, Morita M, Takei S. Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer. Electronic Materials. 2025; 6(4):13. https://doi.org/10.3390/electronicmat6040013

Hayashi, Hiryu, Yuna Hachikubo, Mano Ando, Misaki Oshima, Mayu Morita, and Satoshi Takei. 2025. "Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer" Electronic Materials 6, no. 4: 13. https://doi.org/10.3390/electronicmat6040013

Hayashi, H., Hachikubo, Y., Ando, M., Oshima, M., Morita, M., & Takei, S. (2025). Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer. Electronic Materials, 6(4), 13. https://doi.org/10.3390/electronicmat6040013