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Journal: Surfaces, 2021
Volume: 4
Number: 13
Article:
Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films
Authors:
by
Yannick Hermans, Faraz Mehmood, Kerstin Lakus-Wollny, Jan P. Hofmann, Thomas Mayer and Wolfram Jaegermann
Link:
https://www.mdpi.com/2571-9637/4/2/13
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