Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films
Abstract
:1. Introduction
2. Materials and Methods
3. Results
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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ZnWO4 | Zn 2p3/2 | W 4f | O 1s | Na 1s |
---|---|---|---|---|
amorphous | 17% | 17% | 66% | - |
monoclinic | 31% | 7% | 56% | 6% |
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Hermans, Y.; Mehmood, F.; Lakus-Wollny, K.; Hofmann, J.P.; Mayer, T.; Jaegermann, W. Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films. Surfaces 2021, 4, 106-114. https://doi.org/10.3390/surfaces4020013
Hermans Y, Mehmood F, Lakus-Wollny K, Hofmann JP, Mayer T, Jaegermann W. Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films. Surfaces. 2021; 4(2):106-114. https://doi.org/10.3390/surfaces4020013
Chicago/Turabian StyleHermans, Yannick, Faraz Mehmood, Kerstin Lakus-Wollny, Jan P. Hofmann, Thomas Mayer, and Wolfram Jaegermann. 2021. "Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films" Surfaces 4, no. 2: 106-114. https://doi.org/10.3390/surfaces4020013
APA StyleHermans, Y., Mehmood, F., Lakus-Wollny, K., Hofmann, J. P., Mayer, T., & Jaegermann, W. (2021). Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films. Surfaces, 4(2), 106-114. https://doi.org/10.3390/surfaces4020013