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Journal: Plasma, 2025
Volume: 8
Number: 48
Article:
Role of CF4 Addition in Gas-Phase Variations in HF Plasma for Cryogenic Etching: Insights from Plasma Simulation and Experimental Correlation
Authors:
by
Shigeyuki Takagi, Shih-Nan Hsiao, Yusuke Imai, Makoto Sekine and Fumihiko Matsunaga
Link:
https://www.mdpi.com/2571-6182/8/4/48
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