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Journal: Plasma, 2023
Volume: 6
Number: 33

Article: Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method
Authors: by Chuen-Lin Tien, Chun-Yu Chiang and Shih-Chin Lin
Link: https://www.mdpi.com/2571-6182/6/3/33

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