Liu, Y.; Yang, S.; Wang, W.; Wang, S.; An, Q.; Huang, M.; Suo, S.
A Novel Fractal Model for Contact Resistance Based on Axisymmetric Sinusoidal Asperity. Fractal Fract. 2024, 8, 544.
https://doi.org/10.3390/fractalfract8090544
AMA Style
Liu Y, Yang S, Wang W, Wang S, An Q, Huang M, Suo S.
A Novel Fractal Model for Contact Resistance Based on Axisymmetric Sinusoidal Asperity. Fractal and Fractional. 2024; 8(9):544.
https://doi.org/10.3390/fractalfract8090544
Chicago/Turabian Style
Liu, Yue, Shihao Yang, Weikun Wang, Shuai Wang, Qi An, Min Huang, and Shuangfu Suo.
2024. "A Novel Fractal Model for Contact Resistance Based on Axisymmetric Sinusoidal Asperity" Fractal and Fractional 8, no. 9: 544.
https://doi.org/10.3390/fractalfract8090544
APA Style
Liu, Y., Yang, S., Wang, W., Wang, S., An, Q., Huang, M., & Suo, S.
(2024). A Novel Fractal Model for Contact Resistance Based on Axisymmetric Sinusoidal Asperity. Fractal and Fractional, 8(9), 544.
https://doi.org/10.3390/fractalfract8090544