Liu, P.; Dai, C.; Gao, M.; Wang, X.; Liu, S.; Jin, X.; Li, T.; Zhao, M.
Development of the Gemini Gel-Forming Surfactant with Ultra-High Temperature Resistance to 200 °C. Gels 2022, 8, 600.
https://doi.org/10.3390/gels8100600
AMA Style
Liu P, Dai C, Gao M, Wang X, Liu S, Jin X, Li T, Zhao M.
Development of the Gemini Gel-Forming Surfactant with Ultra-High Temperature Resistance to 200 °C. Gels. 2022; 8(10):600.
https://doi.org/10.3390/gels8100600
Chicago/Turabian Style
Liu, Peng, Caili Dai, Mingwei Gao, Xiangyu Wang, Shichun Liu, Xiao Jin, Teng Li, and Mingwei Zhao.
2022. "Development of the Gemini Gel-Forming Surfactant with Ultra-High Temperature Resistance to 200 °C" Gels 8, no. 10: 600.
https://doi.org/10.3390/gels8100600
APA Style
Liu, P., Dai, C., Gao, M., Wang, X., Liu, S., Jin, X., Li, T., & Zhao, M.
(2022). Development of the Gemini Gel-Forming Surfactant with Ultra-High Temperature Resistance to 200 °C. Gels, 8(10), 600.
https://doi.org/10.3390/gels8100600