Article Versions Notes

Abdalmegeed D, Zhao G, Cheng P, Bhat JA, Khattak WA, Ali MG, Alnadari F, Ali I, Ali Q, Korma SA, et al. The Importance of Nitric Oxide as the Molecular Basis of the Hydrogen Gas Fumigation-Induced Alleviation of Cd Stress on Ganoderma lucidum. Journal of Fungi. 2022; 8(1):10. https://doi.org/10.3390/jof8010010

Abdalmegeed, Dyaaaldin, Gan Zhao, Pengfei Cheng, Javaid A. Bhat, Wajid Ali Khattak, Mostafa G. Ali, Fawze Alnadari, Ilyas Ali, Qurban Ali, Sameh A. Korma, and et al. 2022. "The Importance of Nitric Oxide as the Molecular Basis of the Hydrogen Gas Fumigation-Induced Alleviation of Cd Stress on Ganoderma lucidum" Journal of Fungi 8, no. 1: 10. https://doi.org/10.3390/jof8010010

Abdalmegeed, D., Zhao, G., Cheng, P., Bhat, J. A., Khattak, W. A., Ali, M. G., Alnadari, F., Ali, I., Ali, Q., Korma, S. A., Mahmoud, Y. A.-G., Abd Elnabi, M. K., Cui, W., & Shen, W. (2022). The Importance of Nitric Oxide as the Molecular Basis of the Hydrogen Gas Fumigation-Induced Alleviation of Cd Stress on Ganoderma lucidum. Journal of Fungi, 8(1), 10. https://doi.org/10.3390/jof8010010