Nedev, R.; Mateos-Anzaldo, D.; Osuna-Escalante, E.; Perez-Landeros, O.; Curiel-Alvarez, M.; Osorio-Urquizo, E.; Castillo-Saenz, J.; Lopez-Medina, J.; Valdez-Salas, B.; Nedev, N.
Effect of Deposition Temperature and Thermal Annealing on the Properties of Sputtered NiOx/Si Heterojunction Photodiodes. Inorganics 2025, 13, 11.
https://doi.org/10.3390/inorganics13010011
AMA Style
Nedev R, Mateos-Anzaldo D, Osuna-Escalante E, Perez-Landeros O, Curiel-Alvarez M, Osorio-Urquizo E, Castillo-Saenz J, Lopez-Medina J, Valdez-Salas B, Nedev N.
Effect of Deposition Temperature and Thermal Annealing on the Properties of Sputtered NiOx/Si Heterojunction Photodiodes. Inorganics. 2025; 13(1):11.
https://doi.org/10.3390/inorganics13010011
Chicago/Turabian Style
Nedev, Roumen, David Mateos-Anzaldo, Eddue Osuna-Escalante, Oscar Perez-Landeros, Mario Curiel-Alvarez, Esteban Osorio-Urquizo, Jhonathan Castillo-Saenz, Javier Lopez-Medina, Benjamin Valdez-Salas, and Nicola Nedev.
2025. "Effect of Deposition Temperature and Thermal Annealing on the Properties of Sputtered NiOx/Si Heterojunction Photodiodes" Inorganics 13, no. 1: 11.
https://doi.org/10.3390/inorganics13010011
APA Style
Nedev, R., Mateos-Anzaldo, D., Osuna-Escalante, E., Perez-Landeros, O., Curiel-Alvarez, M., Osorio-Urquizo, E., Castillo-Saenz, J., Lopez-Medina, J., Valdez-Salas, B., & Nedev, N.
(2025). Effect of Deposition Temperature and Thermal Annealing on the Properties of Sputtered NiOx/Si Heterojunction Photodiodes. Inorganics, 13(1), 11.
https://doi.org/10.3390/inorganics13010011
