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Effect of Annealing Treatment on Laser-Induced Damage Characteristics of Non-Quarter-Wave HfO2/SiO2 Antireflection Films
 
 
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Photonics 2026, 13(9), 886; https://doi.org/10.3390/photonics13090886 (registering DOI)
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article pdf uploaded. 19 September 2026 10:51 CEST Version of Record https://www.mdpi.com/2304-6732/13/9/886/pdf
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