Dual-Wavelength Operation at 607 nm and 640 nm with the Same Threshold and Slope Efficiency in Pr3+:LiLuF4 Crystal
Abstract
1. Introduction
2. Theoretical Analysis
3. Experimental Setup
4. Results and Discussion
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Huang, H.; Xia, J.; Anh, N.; Li, Y.; Lü, Y. Dual-Wavelength Operation at 607 nm and 640 nm with the Same Threshold and Slope Efficiency in Pr3+:LiLuF4 Crystal. Photonics 2025, 12, 447. https://doi.org/10.3390/photonics12050447
Huang H, Xia J, Anh N, Li Y, Lü Y. Dual-Wavelength Operation at 607 nm and 640 nm with the Same Threshold and Slope Efficiency in Pr3+:LiLuF4 Crystal. Photonics. 2025; 12(5):447. https://doi.org/10.3390/photonics12050447
Chicago/Turabian StyleHuang, Haotian, Jing Xia, Nguyentuan Anh, Yuzhao Li, and Yanfei Lü. 2025. "Dual-Wavelength Operation at 607 nm and 640 nm with the Same Threshold and Slope Efficiency in Pr3+:LiLuF4 Crystal" Photonics 12, no. 5: 447. https://doi.org/10.3390/photonics12050447
APA StyleHuang, H., Xia, J., Anh, N., Li, Y., & Lü, Y. (2025). Dual-Wavelength Operation at 607 nm and 640 nm with the Same Threshold and Slope Efficiency in Pr3+:LiLuF4 Crystal. Photonics, 12(5), 447. https://doi.org/10.3390/photonics12050447