Article Versions Notes

Hwang SH, Koga K, Hao Y, Attri P, Okumura T, Kamataki K, Itagaki N, Shiratani M, Oh J-S, Takabayashi S, et al. Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH₄ Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes. 2021; 9(1):2. https://doi.org/10.3390/pr9010002

Hwang, Sung Hwa, Kazunori Koga, Yuan Hao, Pankaj Attri, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, and et al. 2021. "Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH₄ Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method" Processes 9, no. 1: 2. https://doi.org/10.3390/pr9010002

Hwang, S. H., Koga, K., Hao, Y., Attri, P., Okumura, T., Kamataki, K., Itagaki, N., Shiratani, M., Oh, J.-S., Takabayashi, S., & Nakatani, T. (2021). Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH₄ Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method. Processes, 9(1), 2. https://doi.org/10.3390/pr9010002