Chen, Z.; Wang, R.; Bai, H.; Li, Y.; Hu, T.; Cui, W.
Global Modeling of Microwave Discharge Plasma in Humid Air Within a Cavity Filter: Reaction Kinetics and Dynamics. Electronics 2025, 14, 4278.
https://doi.org/10.3390/electronics14214278
AMA Style
Chen Z, Wang R, Bai H, Li Y, Hu T, Cui W.
Global Modeling of Microwave Discharge Plasma in Humid Air Within a Cavity Filter: Reaction Kinetics and Dynamics. Electronics. 2025; 14(21):4278.
https://doi.org/10.3390/electronics14214278
Chicago/Turabian Style
Chen, Zeyu, Rui Wang, He Bai, Yafeng Li, Tiancun Hu, and Wanzhao Cui.
2025. "Global Modeling of Microwave Discharge Plasma in Humid Air Within a Cavity Filter: Reaction Kinetics and Dynamics" Electronics 14, no. 21: 4278.
https://doi.org/10.3390/electronics14214278
APA Style
Chen, Z., Wang, R., Bai, H., Li, Y., Hu, T., & Cui, W.
(2025). Global Modeling of Microwave Discharge Plasma in Humid Air Within a Cavity Filter: Reaction Kinetics and Dynamics. Electronics, 14(21), 4278.
https://doi.org/10.3390/electronics14214278