Ma, Y.; Chen, L.; Dong, Z.; Hong, Y.; Xiao, Y.; Xin, Y.; Zhang, B.; Qin, H.; Zhang, T.; Zhang, X.;
et al. Current Drops in CF4 Plasma-Treated AlGaN/GaN Heterojunction in Polar Gas Ambient. Electronics 2023, 12, 1809.
https://doi.org/10.3390/electronics12081809
AMA Style
Ma Y, Chen L, Dong Z, Hong Y, Xiao Y, Xin Y, Zhang B, Qin H, Zhang T, Zhang X,
et al. Current Drops in CF4 Plasma-Treated AlGaN/GaN Heterojunction in Polar Gas Ambient. Electronics. 2023; 12(8):1809.
https://doi.org/10.3390/electronics12081809
Chicago/Turabian Style
Ma, Ying, Liang Chen, Zhihua Dong, Yifang Hong, Yang Xiao, Yijie Xin, Bin Zhang, Hua Qin, Ting Zhang, Xiaodong Zhang,
and et al. 2023. "Current Drops in CF4 Plasma-Treated AlGaN/GaN Heterojunction in Polar Gas Ambient" Electronics 12, no. 8: 1809.
https://doi.org/10.3390/electronics12081809
APA Style
Ma, Y., Chen, L., Dong, Z., Hong, Y., Xiao, Y., Xin, Y., Zhang, B., Qin, H., Zhang, T., Zhang, X., Yu, G., Cheng, Z., Mao, L., & Cai, Y.
(2023). Current Drops in CF4 Plasma-Treated AlGaN/GaN Heterojunction in Polar Gas Ambient. Electronics, 12(8), 1809.
https://doi.org/10.3390/electronics12081809