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Open AccessArticle

The Role of Substrate Temperature and Magnetic Filtering for DLC by Cathodic Arc Evaporation

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Department of Engineering and Natural Sciences, Technical University of Applied Sciences Wildau, Hochschulring 1, 15745 Wildau, Germany
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Department of Physics, University of Roma Tor Vergata, Via della Ricerca Scientifica, 1, 00133 Roma, Italy
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IHP Innovations for High Performance Microelectronics, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
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Arc Precision GmbH, Schwartzkopffstraße 2, 15745 Wildau, Germany
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Department of Industrial Engineering, University of Rome Tor Vergata, Via del Politecnico 1, 00133 Rome, Italy
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(5), 345; https://doi.org/10.3390/coatings9050345
Received: 2 May 2019 / Revised: 20 May 2019 / Accepted: 23 May 2019 / Published: 27 May 2019
(This article belongs to the Special Issue Functional Thin Films: Design, Fabrication and Applications)
Diamond-like carbon (DLC) films were deposited using two different types of high current arc evaporation. The first process used a magnetic particle filter to remove droplets from the plasma. For the second process, the samples were put into a metallic cage which was placed directly above the plasma source. For both processes, we varied the substrate temperature from 21 to 350 °C in order to investigate the temperature effect. The samples were characterized using SEM, AFM, XPS, Raman Spectroscopy, Ellipsometry, Photometry, and Nano Indentation in order to compare both methods of deposition and provide a careful characterization of such DLC films. We found that the sp3 content and the hardness can be precisely adjusted by changing the substrate temperature. Furthermore, in the case of unfiltered deposition, the optical constants can be shifted in the direction of higher absorbance in order to produce black and hard carbon coatings. View Full-Text
Keywords: DLC; ta-C; arc evaporation; substrate temperature; hardness; optical constants; Ellipsometry DLC; ta-C; arc evaporation; substrate temperature; hardness; optical constants; Ellipsometry
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MDPI and ACS Style

Lux, H.; Edling, M.; Lucci, M.; Kitzmann, J.; Villringer, C.; Siemroth, P.; De Matteis, F.; Schrader, S. The Role of Substrate Temperature and Magnetic Filtering for DLC by Cathodic Arc Evaporation. Coatings 2019, 9, 345.

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