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Correlation of Impedance Matching and Optical Emission Spectroscopy during Plasma-Enhanced Chemical Vapor Deposition of Nanocrystalline Silicon Thin Films

1
Opto-mechatronics Engineering, National Central University, Taoyuan 32001, Taiwan
2
Department of Mechanical Engineering, National Central University, Taoyuan 32001, Taiwan
3
Optical Science Center, National Central University, Taoyuan 32001, Taiwan
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(5), 305; https://doi.org/10.3390/coatings9050305
Received: 4 March 2019 / Revised: 22 April 2019 / Accepted: 30 April 2019 / Published: 6 May 2019
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Abstract

In this paper, the correlation of impedance matching and optical emission spectroscopy during plasma-enhanced chemical vapor deposition (PECVD) was systematically investigated in SiH4 plasma diluted by various hydrogen dilution ratios. At the onset of nanocrystallinity in SiH4− depleted plasma condition, the SiH+ radical reached a threshold value as the dominant radical, such that a-Si to nc-Si transition was obtained. Furthermore, the experimental data of impedance analysis showed that matching behavior can be greatly influenced by variable plasma parameters due to the change of various hydrogen dilution ratios, which is consistent with the recorded optical emission spectra (OES) of Hα* radicals. Quadruple mass spectrometry (QMS) and transmission electron microscopy (TEM) were employed as associated diagnostic and characterization tools to confirm the phase transformation and existence of silicon nanocrystals. View Full-Text
Keywords: nanocrystalline; hydrogen dilution ratio; optical emission spectroscopy; crystalline fraction; crystallite size; impedance analysis nanocrystalline; hydrogen dilution ratio; optical emission spectroscopy; crystalline fraction; crystallite size; impedance analysis
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Kau, L.-H.; Huang, H.-J.; Chang, H.-E.; Hsieh, Y.-L.; Lee, C.-C.; Fuh, Y.-K.; Li, T.T. Correlation of Impedance Matching and Optical Emission Spectroscopy during Plasma-Enhanced Chemical Vapor Deposition of Nanocrystalline Silicon Thin Films. Coatings 2019, 9, 305.

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