Next Article in Journal
Annealing-Driven Microstructural Evolution and Its Effects on the Surface and Nanomechanical Properties of Cu-Doped NiO Thin Films
Previous Article in Journal
Investigation of Polymer Coatings Formed by Polyvinyl Alcohol and Silver Nanoparticles on Copper Surface in Acid Medium by Means of Deep Convolutional Neural Networks
Previous Article in Special Issue
Effect of the Molybdenum Substrate Shape on Mo2C Coating Electrodeposition
Article Menu
Issue 2 (February) cover image

Export Article

Open AccessArticle
Coatings 2019, 9(2), 106; https://doi.org/10.3390/coatings9020106

Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering

Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland
*
Author to whom correspondence should be addressed.
Received: 12 December 2018 / Revised: 1 February 2019 / Accepted: 5 February 2019 / Published: 8 February 2019
(This article belongs to the Special Issue Thin Film Deposition and Characterization Techniques)
Full-Text   |   PDF [6779 KB, uploaded 18 February 2019]   |  

Abstract

The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO2) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO2 films’ microstructure. As-deposited hafnia thin films exhibit nanocrystalline structure with a monoclinic phase, however the rise of the sputtering power results in an increase of crystallite sizes. Atomic force microscopy investigations show that the surface of the deposited films is smooth, crack-free, and composed of visible grains. The surface roughness and the value of the water contact angle increase with the increase of the sputtering power. Measurements of the optical properties show that HfO2 coatings are transparent in the visible wavelength range. A higher sputtering power causes a decrease of an average transmittance level and a simultaneous increase of the real part of the refractive index. Nanoindentation measurements reveal that the thin film hardness and Young’s elastic modulus increase with an increase in the sputtering power. Moreover, the results of plasticity index H/E and plastic resistance parameter H3/E2 are discussed. Based on the obtained results, a correlation between the sputtering power and the structural, surface, and optical properties, as well as the hardness and Young’s elastic modulus, were determined. View Full-Text
Keywords: HfO2 thin films; sputtering; surface properties; hardness; Young’s elastic modulus HfO2 thin films; sputtering; surface properties; hardness; Young’s elastic modulus
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
SciFeed

Share & Cite This Article

MDPI and ACS Style

Wiatrowski, A.; Obstarczyk, A.; Mazur, M.; Kaczmarek, D.; Wojcieszak, D. Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering. Coatings 2019, 9, 106.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Coatings EISSN 2079-6412 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top