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Open AccessArticle

Tunable Plasmonic Resonances in TiN Nanorod Arrays

1
Department of Electro-Optical Engineering, National Taipei University of Technology, Taipei 106, Taiwan
2
Taiwan Instrument Research Institute, Hsinchu 300, Taiwan
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(12), 863; https://doi.org/10.3390/coatings9120863
Received: 7 November 2019 / Revised: 12 December 2019 / Accepted: 13 December 2019 / Published: 16 December 2019
(This article belongs to the Section Thin Films)
In this work, titanium nitride (TiN) nanorod arrays were fabricated using glancing angle deposition in a magnetron sputtering system. The deposition parameters, including the bias on the substrate and the flow rate of nitrogen, were varied to deposit various TiN nanorod arrays. Before glancing angle deposition was conducted, uniform TiN films were deposited and their permittivity spectra, for various deposition parameters, were obtained. The effect of the deposition parameters on the morphology of the nanorods is analyzed here. The polarization-dependent extinctance spectra of TiN nanorod arrays were measured and compared. Extinction, which corresponds to the longitudinal mode of localized surface plasmon resonance, can be significantly changed by tuning the N2 flow rate and substrate bias voltage during deposition. View Full-Text
Keywords: titanium nitride; nanorod array; plasmonic mode; permittivity; glancing angle deposition titanium nitride; nanorod array; plasmonic mode; permittivity; glancing angle deposition
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MDPI and ACS Style

Jen, Y.-J.; Chan, T.-L.; Liao, B.-H.; Li, Z.-X.; Liu, W.-C.; Cong, M.-Y. Tunable Plasmonic Resonances in TiN Nanorod Arrays. Coatings 2019, 9, 863.

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