Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation

Wang, Jie; Gao, Yong; You, Zhiming; Fan, Jiakun; Zhang, Jing; Qiao, Zhaopeng; Wang, Sheng; Xu, Zhanglian

doi:10.3390/coatings9120839

Open AccessArticle

Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation

by

Jie Wang

,

Yong Gao

,

Zhiming You

,

Jiakun Fan

,

Jing Zhang

,

Zhaopeng Qiao

,

Sheng Wang

^* and

Zhanglian Xu

^*

Shaanxi Engineering Research Center of Advanced Nuclear Energy & Shaanxi Key Laboratory of Advanced Nuclear Energy and Technology & School of Energy and Power Engineering, Xi’an Jiaotong University, Xi’an 710049, China

^*

Authors to whom correspondence should be addressed.

Coatings 2019, 9(12), 839; https://doi.org/10.3390/coatings9120839

Submission received: 17 September 2019 / Revised: 27 November 2019 / Accepted: 6 December 2019 / Published: 9 December 2019

(This article belongs to the Section Surface Characterization, Deposition and Modification)

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Abstract

For improving the vacuum and mitigating the electron clouds in ultra-high vacuum chamber systems of high-energy accelerators, the deposition of Ti-V-Hf-Zr getter film on a laser-treated aluminum alloy substrate was proposed and exploited for the first time in this study. The laser-treated aluminum surface exhibits a low secondary electron yield (SEY), which is even lower than 1 for some selected laser parameters. Non-evaporable getter (NEG) Ti-V-Hf-Zr film coatings were prepared using the direct current (DC) sputtering method. The surface morphology, surface roughness and composition of Ti-V-Hf-Zr getter films were characterized and analyzed. The maximum SEY of unactivated Ti-V-Hf-Zr getter film on laser-treated aluminum alloy substrates ranged from 1.10 to 1.48. The X-ray photoelectron spectroscopy (XPS) spectra demonstrate that the Ti-V-Hf-Zr coated laser-treated aluminum alloy could be partially activated after being heated at 100 and 150 °C, respectively, for 1 h in a vacuum and also used as a pump. The results were demonstrated initially and the potential application should be considered in future particle accelerators.

Keywords: film coating; getters; particle accelerators; secondary electron yield; electron cloud

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MDPI and ACS Style

Wang, J.; Gao, Y.; You, Z.; Fan, J.; Zhang, J.; Qiao, Z.; Wang, S.; Xu, Z. Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation. Coatings 2019, 9, 839. https://doi.org/10.3390/coatings9120839

AMA Style

Wang J, Gao Y, You Z, Fan J, Zhang J, Qiao Z, Wang S, Xu Z. Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation. Coatings. 2019; 9(12):839. https://doi.org/10.3390/coatings9120839

Chicago/Turabian Style

Wang, Jie, Yong Gao, Zhiming You, Jiakun Fan, Jing Zhang, Zhaopeng Qiao, Sheng Wang, and Zhanglian Xu. 2019. "Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation" Coatings 9, no. 12: 839. https://doi.org/10.3390/coatings9120839

APA Style

Wang, J., Gao, Y., You, Z., Fan, J., Zhang, J., Qiao, Z., Wang, S., & Xu, Z. (2019). Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation. Coatings, 9(12), 839. https://doi.org/10.3390/coatings9120839

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Non-Evaporable Getter Ti-V-Hf-Zr Film Coating on Laser-Treated Aluminum Alloy Substrate for Electron Cloud Mitigation

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