Next Article in Journal
Porosity Characterization of Cold Sprayed Stainless Steel Coating Using Three-Dimensional X-ray Microtomography
Next Article in Special Issue
Design and Fabrication of Moth-Eye Subwavelength Structure with a Waist on Silicon for Broadband and Wide-Angle Anti-Reflection Property
Previous Article in Journal
Torsional Fretting Wear Properties of Thermal Oxidation-Treated Ti3SiC2 Coatings
Previous Article in Special Issue
Online Characterization Algorithms for Optical Coating Production with Broadband Monitoring
Article Menu
Issue 9 (September) cover image

Export Article

Open AccessReview
Coatings 2018, 8(9), 325; https://doi.org/10.3390/coatings8090325

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

1
School of OptoElectronic Engineering, Changchun University of the Science and Technology, Changchun 130022, China
2
Institute of Thin Films, Sensors and Imaging, School of Engineering and Computing, University of the West of Scotland, Paisley PA1 2BE, UK
3
School of Material Science and Engineering, Chongqing University of Science and Technology, Chongqing 401331, China
*
Authors to whom correspondence should be addressed.
Received: 8 July 2018 / Revised: 30 July 2018 / Accepted: 12 September 2018 / Published: 16 September 2018
(This article belongs to the Special Issue Applications of Optical Thin Film Coatings)
Full-Text   |   PDF [19136 KB, uploaded 20 September 2018]   |  

Abstract

Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%. View Full-Text
Keywords: thin film uniformity; physical vapor deposition; thin film modelling; thickness distribution thin film uniformity; physical vapor deposition; thin film modelling; thickness distribution
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
SciFeed

Share & Cite This Article

MDPI and ACS Style

Wang, B.; Fu, X.; Song, S.; Chu, H.O.; Gibson, D.; Li, C.; Shi, Y.; Wu, Z. Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition. Coatings 2018, 8, 325.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Coatings EISSN 2079-6412 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top