Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates
Abstract
:1. Introduction
2. Experimental Procedure
2.1. Sample Preparation
2.2. Experimental Design, Statistical Method, and Test Realization
3. Results and Discussion
3.1. Influence of Process Parameters on Texture
3.2. Layer Composition
3.3. Influence of Nitrogen to Argon Ratio on Morphology
3.3.1. Nitrogen to Argon Ratio 0%
3.3.2. Nitrogen to Argon Ratio 5%
3.3.3. Nitrogen to Argon Ratio 10%
3.4. Substrate Influence
3.4.1. Nucleation
3.4.2. Consideration of the Thermal Conditions
3.4.3. Layer Stress
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
Appendix A
Appendix B
Exp. No. | Set Point | Measured results | RTC(002) | |||||
Heater Temperature [°C] | RF Power [W] | Targeted Thickness [µm] | Nitrogen Gas Flow [sccm] | Rate [nm min−1] | Thickness [nm] | Si | 9k7 | |
1 b | 20 | 300 | 0.3 | 0 | 8 | 1400 | n.a. | n.a. |
2 | 20 | 400 | 1 | 4 | 27 | 3500 | 12 | 5 |
3 | 20 | 500 | 1.7 | 8 | 25 | 4300 | 53 | 52 |
4 | 150 | 300 | 1 | 8 | 13 | 2400 | 54 | 64 |
5 a | 150 | 400 | 1.7 | 0 | 31 | 6000 | 19 | 22 |
6 b | 150 | 500 | 0.3 | 4 | 22 | 700 | n.a. | n.a. |
7 | 300 | 300 | 1.7 | 4 | 18 | 5200 | 50 | 7.5 |
8 | 300 | 400 | 0.3 | 8 | 17 | 670 | 20 | 40 |
9 a | 300 | 500 | 1 | 0 | 43 | 4500 | 18 | 22 |
10 | 300 | 400 | 1.7 | 8 | 23 | 7100 | n.a. | 60 |
Exp. No. | Mean size of Ordered Domains d | Stress [GPa] | Adhesion | |||||
Si | 9k7 | Si | 9k7 | |||||
Si [nm] | 9k7 [nm] | σxx | σzz | σxx | σzz | |||
1 b | n.a. | n.a. | n.a. | n.a. | n.a. | n.a. | + | ++ |
2 | 19(200) | 21(110) | −0.34 | 0.41 | 0.21 | −1.03 | − | ++ |
3 | 27 | 24 | −0.03 | 0.90 | −0.02 | −0.69 | − | ++ |
4 | 23 | 23 | −0.81 | 1.34 | 0.04 | −0.71 | − | ++ |
5 a | 13 b | 12 b | −2.40 | 2.46 | −1.17 | 1.39 | − | ++ |
6 b | n.a. | n.a. | n.a. | n.a. | n.a. | n.a. | ++ | ++ |
7 | 26 | 22(110) | 0.67 | 0.57 | 0.18 | −0.37 | − | ++ |
8 | 30(112) | 14 | n.a. | n.a. | n.a. | n.a. | ++ | ++ |
9 a | 8 c | 13 c | 0.10 | 3.35 | −1.08 | 1.94 | + | ++ |
10 | n.a. | 24 | n.a. | n.a. | −0.06 | −0.64 | − − | ++ |
Appendix C
Material | kth (W/mK) | α (10−6 m2/s) | (103 kg/m3) |
---|---|---|---|
Silicon | 156 [53] ~150 [44] | 88.0 [54,55] 76.9 [56] | 2.329002 [57] |
Alumina | 36.96 [58] 30.5 * [59] | 12 [58] 13.7 [56] | 3.48 * [59] |
Material | min | csp [J kg−1] average | max |
---|---|---|---|
Silicon | 761 | 816 | 871 |
Alumina | 640 | 710 | 781 |
Specific Heat Capacity Csp [J kg−1 K−1] | Cth | τ [s] | 5τ [s] | 5τ [min] | ||
---|---|---|---|---|---|---|
Si | – | – | – | – | ||
871 | 1.017 | 3.4 | 17 | 0.3 | ||
703 | 0.821 | 2.7 | 13.7 | 0.2 | ||
Alumina | glass | ceramic * | ||||
990 | 800 | 895 | 2.497 | 681 | 3405 | 57 |
640 | 503 | 571 | 1.594 | 435 | 2174 | 36 |
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Bartsch, H.; Grieseler, R.; Mánuel, J.; Pezoldt, J.; Müller, J. Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates. Coatings 2018, 8, 289. https://doi.org/10.3390/coatings8080289
Bartsch H, Grieseler R, Mánuel J, Pezoldt J, Müller J. Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates. Coatings. 2018; 8(8):289. https://doi.org/10.3390/coatings8080289
Chicago/Turabian StyleBartsch, Heike, Rolf Grieseler, Jose Mánuel, Jörg Pezoldt, and Jens Müller. 2018. "Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates" Coatings 8, no. 8: 289. https://doi.org/10.3390/coatings8080289