Order Article Reprints

Wang Q, Fang L, Liu Q, Chen L, Wang Q, Meng X, Xiao H. Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering. Coatings. 2018; 8(4):146. https://doi.org/10.3390/coatings8040146

Wang, Qingfu, Liping Fang, Qinghe Liu, Lin Chen, Qinguo Wang, Xiandong Meng, and Hong Xiao. 2018. "Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering" Coatings 8, no. 4: 146. https://doi.org/10.3390/coatings8040146

Wang, Q., Fang, L., Liu, Q., Chen, L., Wang, Q., Meng, X., & Xiao, H. (2018). Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering. Coatings, 8(4), 146. https://doi.org/10.3390/coatings8040146