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Journal: Coatings, 2018
Volume: 8
Number: 431

Article: Growth without Postannealing of Monoclinic VO2 Thin Film by Atomic Layer Deposition Using VCl4 as Precursor
Authors: by Wen-Jen Lee and Yong-Han Chang
Link: https://www.mdpi.com/2079-6412/8/12/431

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