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Article

Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

1
R & D Center for Low-Cost Plasma and Nanotechnology Surface Modifications (CEPLANT), Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 267/2, 611 37 Brno, Czech Republic
2
Department of Condensed Matter Physics, Masaryk University, Kotlářská 267/2, 611 37 Brno, Czech Republic
3
Institute of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czech Republic
4
Centre of Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, Nám. Čs. Legií 565, 530 02 Pardubice, Czech Republic
5
Central European Institute of Technology, Brno University of Technology, Purkyňova 123, 612 00 Brno, Czech Republic
*
Author to whom correspondence should be addressed.
Coatings 2018, 8(10), 369; https://doi.org/10.3390/coatings8100369
Received: 31 August 2018 / Revised: 12 October 2018 / Accepted: 15 October 2018 / Published: 18 October 2018
(This article belongs to the Special Issue Atomic Layer Deposition)
Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 °C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements. View Full-Text
Keywords: vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure vapour deposition; copper chloride; characterization; optical properties; XPS; crystal structure
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MDPI and ACS Style

Krumpolec, R.; Homola, T.; Cameron, D.C.; Humlíček, J.; Caha, O.; Kuldová, K.; Zazpe, R.; Přikryl, J.; Macak, J.M. Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition. Coatings 2018, 8, 369. https://doi.org/10.3390/coatings8100369

AMA Style

Krumpolec R, Homola T, Cameron DC, Humlíček J, Caha O, Kuldová K, Zazpe R, Přikryl J, Macak JM. Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition. Coatings. 2018; 8(10):369. https://doi.org/10.3390/coatings8100369

Chicago/Turabian Style

Krumpolec, Richard, Tomáš Homola, David C. Cameron, Josef Humlíček, Ondřej Caha, Karla Kuldová, Raul Zazpe, Jan Přikryl, and Jan M. Macak 2018. "Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition" Coatings 8, no. 10: 369. https://doi.org/10.3390/coatings8100369

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