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Open AccessArticle

Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition

School of Materials Science and Engineering, Pusan National University, Busan 46241, Korea
Department of Nuclear and Energy Engineering, Jeju National University, Jeju 690-756, Korea
Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan 46241, Korea
Department of Materials Science and Engineering, College of Engineering at Seoul National University, Seoul 08826, Korea
Author to whom correspondence should be addressed.
Academic Editor: Alessandro Lavacchi
Coatings 2018, 8(1), 15;
Received: 15 November 2017 / Revised: 12 December 2017 / Accepted: 28 December 2017 / Published: 29 December 2017
(This article belongs to the Special Issue Hybrid Surface Coatings & Process (Selected Papers from HyMaP 2017))
To optimize the deposition parameters of diamond films, the temperature, pressure, and distance between the filament and the susceptor need to be considered. However, it is difficult to precisely measure and predict the filament and susceptor temperature in relation to the applied power in a hot filament chemical vapor deposition (HF-CVD) system. In this study, the temperature distribution inside the system was numerically calculated for the applied powers of 12, 14, 16, and 18 kW. The applied power needed to achieve the appropriate temperature at a constant pressure and other conditions was deduced, and applied to actual experimental depositions. The numerical simulation was conducted using the commercial computational fluent dynamics software ANSYS-FLUENT. To account for radiative heat-transfer in the HF-CVD reactor, the discrete ordinate (DO) model was used. The temperatures of the filament surface and the susceptor at different power levels were predicted to be 2512–2802 K and 1076–1198 K, respectively. Based on the numerical calculations, experiments were performed. The simulated temperatures for the filament surface were in good agreement with the experimental temperatures measured using a two-color pyrometer. The results showed that the highest deposition rate and the lowest deposition of non-diamond was obtained at a power of 16 kW. View Full-Text
Keywords: diamond film; computer simulation; temperature; HF-CVD diamond film; computer simulation; temperature; HF-CVD
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Song, C.W.; Lee, Y.H.; Heo, S.Y.; Hwang, N.-M.; Choi, S.; Kim, K.H. Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition. Coatings 2018, 8, 15.

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