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Open AccessArticle

Characterization of Hydroxyapatite (HA) Sputtering Targets by APS Methods

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Department of Mechanical Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan
2
Institute of Mechanical and Electrical Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan
3
Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan
*
Author to whom correspondence should be addressed.
Academic Editors: James Kit-hon Tsoi and Krasimir Vasilev
Coatings 2017, 7(11), 197; https://doi.org/10.3390/coatings7110197
Received: 29 June 2017 / Revised: 29 October 2017 / Accepted: 7 November 2017 / Published: 11 November 2017
(This article belongs to the Special Issue Dental Implant Surface: Science and Technology)
Radio frequency (RF) sputtering is a potential medical device coating technology that is commercializable; however, a suitable commercialized target for sputtering the hydroxyapatite (HA) coating onto titanium medical devices is more important. Therefore, this study used three HA targets in conducting sputtering experiments for HA films, which were manufactured in a laboratory by using three different processes: cold pressing and sintering (CPS), hot isostatic pressing (HIP), and atmospheric plasma spraying (APS). Subsequently, the sputtering performance of each type of target and the properties of the HA films were assessed to develop an appropriate process for modifying the surfaces of medical devices. The experimental results showed that the APS target, with a density of approximately 2.83 g/cm3, was suitable for use in HA sputtering. Additionally, the APS target could withstand a high discharge power over 300 W, whereas the CPS target could nearly endure a power below 70 W. The APS target, with Ca/P ratio of 2.401, consisted of a combination of HA, α-tricalcium phosphate (α-TCP), β-TCP, and tetracalcium phosphate phases (TTCP). In addition to being able to perform at a high sputtering power of more than 300 W, the APS target achieved a higher deposition rate than did the CPS target. This study shows that the processing technology used for the APS target is a potential method for applying HA sputtering for the surface modification of artificial aggregates. View Full-Text
Keywords: hydroxyapatite; sputtering target; medical device; atmospheric plasma spraying hydroxyapatite; sputtering target; medical device; atmospheric plasma spraying
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MDPI and ACS Style

Hung, K.-Y.; Lai, H.-C.; Yang, Y.-C.; Feng, H.-P. Characterization of Hydroxyapatite (HA) Sputtering Targets by APS Methods. Coatings 2017, 7, 197.

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