Next Article in Journal
Effective Postharvest Preservation of Kiwifruit and Romaine Lettuce with a Chitosan Hydrochloride Coating
Next Article in Special Issue
Mechanical and Spectroscopic Analysis of Retrieved/Failed Dental Implants
Previous Article in Journal
Nucleation and Growth of Intermetallic Compounds Formed in Boron Steel Hot-Dipped in Al–Ni alloy
Previous Article in Special Issue
Chitosan Coating on Silica-Modified Polymethyl Methacrylate for Dental Applications
Article Menu
Issue 11 (November) cover image

Export Article

Open AccessArticle

Characterization of Hydroxyapatite (HA) Sputtering Targets by APS Methods

Department of Mechanical Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan
Institute of Mechanical and Electrical Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan
Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan
Author to whom correspondence should be addressed.
Academic Editors: James Kit-hon Tsoi and Krasimir Vasilev
Coatings 2017, 7(11), 197;
Received: 29 June 2017 / Revised: 29 October 2017 / Accepted: 7 November 2017 / Published: 11 November 2017
(This article belongs to the Special Issue Dental Implant Surface: Science and Technology)
PDF [5262 KB, uploaded 11 November 2017]


Radio frequency (RF) sputtering is a potential medical device coating technology that is commercializable; however, a suitable commercialized target for sputtering the hydroxyapatite (HA) coating onto titanium medical devices is more important. Therefore, this study used three HA targets in conducting sputtering experiments for HA films, which were manufactured in a laboratory by using three different processes: cold pressing and sintering (CPS), hot isostatic pressing (HIP), and atmospheric plasma spraying (APS). Subsequently, the sputtering performance of each type of target and the properties of the HA films were assessed to develop an appropriate process for modifying the surfaces of medical devices. The experimental results showed that the APS target, with a density of approximately 2.83 g/cm3, was suitable for use in HA sputtering. Additionally, the APS target could withstand a high discharge power over 300 W, whereas the CPS target could nearly endure a power below 70 W. The APS target, with Ca/P ratio of 2.401, consisted of a combination of HA, α-tricalcium phosphate (α-TCP), β-TCP, and tetracalcium phosphate phases (TTCP). In addition to being able to perform at a high sputtering power of more than 300 W, the APS target achieved a higher deposition rate than did the CPS target. This study shows that the processing technology used for the APS target is a potential method for applying HA sputtering for the surface modification of artificial aggregates. View Full-Text
Keywords: hydroxyapatite; sputtering target; medical device; atmospheric plasma spraying hydroxyapatite; sputtering target; medical device; atmospheric plasma spraying

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Hung, K.-Y.; Lai, H.-C.; Yang, Y.-C.; Feng, H.-P. Characterization of Hydroxyapatite (HA) Sputtering Targets by APS Methods. Coatings 2017, 7, 197.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Coatings EISSN 2079-6412 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top