Next Article in Journal
Recent Photocatalytic Applications for Air Purification in Belgium
Previous Article in Journal
Electrochemical Characterization of Multilayer Cr/CrN-Based Coatings
Open AccessArticle

Wetting, Solubility and Chemical Characteristics of Plasma-Polymerized 1-Isopropyl-4-Methyl-1,4-Cyclohexadiene Thin Films

1
Electronic Materials Research Lab, College of Science, Technology and Engineering, James Cook University, Townsville 4811, Australia
2
Applied and Green Photochemistry Group, College of Science, Technology and Engineering, James Cook University, Townsville 4811, Australia
*
Author to whom correspondence should be addressed.
Coatings 2014, 4(3), 527-552; https://doi.org/10.3390/coatings4030527
Received: 8 April 2014 / Revised: 11 July 2014 / Accepted: 22 July 2014 / Published: 31 July 2014
Investigations on the wetting, solubility and chemical composition of plasma polymer thin films provide an insight into the feasibility of implementing these polymeric materials in organic electronics, particularly where wet solution processing is involved. In this study, thin films were prepared from 1-isopropyl-4-methyl-1,4-cyclohexadiene (γ-Terpinene) using radio frequency (RF) plasma polymerization. FTIR showed the polymers to be structurally dissimilar to the original monomer and highly cross-linked, where the loss of original functional groups and the degree of cross-linking increased with deposition power. The polymer surfaces were hydrocarbon-rich, with oxygen present in the form of O–H and C=O functional groups. The oxygen content decreased with deposition power, with films becoming more hydrophobic and, thus, less wettable. The advancing and receding contact angles were investigated, and the water advancing contact angle was found to increase from 63.14° to 73.53° for thin films prepared with an RF power of 10 W to 75 W. The wetting envelopes for the surfaces were constructed to enable the prediction of the surfaces’ wettability for other solvents. The effect of roughness on the wetting behaviour of the films was insignificant. The polymers were determined to resist solubilization in solvents commonly used in the deposition of organic semiconducting layers, including chloroform and chlorobenzene, with higher stability observed in films fabricated at higher RF power. View Full-Text
Keywords: coatings; wetting; plasma polymerization; FTIR; contact angle coatings; wetting; plasma polymerization; FTIR; contact angle
Show Figures

Figure 1

MDPI and ACS Style

Ahmad, J.; Bazaka, K.; Oelgemöller, M.; Jacob, M.V. Wetting, Solubility and Chemical Characteristics of Plasma-Polymerized 1-Isopropyl-4-Methyl-1,4-Cyclohexadiene Thin Films. Coatings 2014, 4, 527-552.

Show more citation formats Show less citations formats

Article Access Map by Country/Region

1
Only visits after 24 November 2015 are recorded.
Search more from Scilit
 
Search
Back to TopTop