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Journal: Coatings, 2023
Volume: 13
Number: 183

Article: Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)
Authors: by Ping-Hsun Wu, Kun-An Chiu, Fu-Han Shih, Yu-Siang Fang, Thi-Hien Do, Wei-Chun Chen and Li Chang
Link: https://www.mdpi.com/2079-6412/13/1/183

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