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Journal: Coatings, 2023
Volume: 13
Number: 183
Article:
Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)
Authors:
by
Ping-Hsun Wu, Kun-An Chiu, Fu-Han Shih, Yu-Siang Fang, Thi-Hien Do, Wei-Chun Chen and Li Chang
Link:
https://www.mdpi.com/2079-6412/13/1/183
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