Merisalu, J.; Jõgiaas, T.; Viskus, T.D.; Kasikov, A.; Ritslaid, P.; Käämbre, T.; Tarre, A.; Kozlova, J.; Mändar, H.; Tamm, A.;
et al. Structure and Electrical Properties of Zirconium-Aluminum-Oxide Films Engineered by Atomic Layer Deposition. Coatings 2022, 12, 431.
https://doi.org/10.3390/coatings12040431
AMA Style
Merisalu J, Jõgiaas T, Viskus TD, Kasikov A, Ritslaid P, Käämbre T, Tarre A, Kozlova J, Mändar H, Tamm A,
et al. Structure and Electrical Properties of Zirconium-Aluminum-Oxide Films Engineered by Atomic Layer Deposition. Coatings. 2022; 12(4):431.
https://doi.org/10.3390/coatings12040431
Chicago/Turabian Style
Merisalu, Joonas, Taivo Jõgiaas, Toomas Daniel Viskus, Aarne Kasikov, Peeter Ritslaid, Tanel Käämbre, Aivar Tarre, Jekaterina Kozlova, Hugo Mändar, Aile Tamm,
and et al. 2022. "Structure and Electrical Properties of Zirconium-Aluminum-Oxide Films Engineered by Atomic Layer Deposition" Coatings 12, no. 4: 431.
https://doi.org/10.3390/coatings12040431
APA Style
Merisalu, J., Jõgiaas, T., Viskus, T. D., Kasikov, A., Ritslaid, P., Käämbre, T., Tarre, A., Kozlova, J., Mändar, H., Tamm, A., Aarik, J., & Kukli, K.
(2022). Structure and Electrical Properties of Zirconium-Aluminum-Oxide Films Engineered by Atomic Layer Deposition. Coatings, 12(4), 431.
https://doi.org/10.3390/coatings12040431
