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Journal: Coatings, 2021
Volume: 11
Number: 268

Article: Low-Damage and Self-Limiting (Al)GaN Etching Process through Atomic Layer Etching Using O2 and BCl3 Plasma
Authors: by Il-Hwan Hwang, Ho-Young Cha and Kwang-Seok Seo
Link: https://www.mdpi.com/2079-6412/11/3/268

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