Zarzycki, A.; Dyndał, K.; Sitarz, M.; Xu, J.; Gao, F.; Marszałek, K.; Rydosz, A.
Influence of GLAD Sputtering Configuration on the Crystal Structure, Morphology, and Gas-Sensing Properties of the WO3 Films. Coatings 2020, 10, 1030.
https://doi.org/10.3390/coatings10111030
AMA Style
Zarzycki A, Dyndał K, Sitarz M, Xu J, Gao F, Marszałek K, Rydosz A.
Influence of GLAD Sputtering Configuration on the Crystal Structure, Morphology, and Gas-Sensing Properties of the WO3 Films. Coatings. 2020; 10(11):1030.
https://doi.org/10.3390/coatings10111030
Chicago/Turabian Style
Zarzycki, Arkadiusz, Katarzyna Dyndał, Maciej Sitarz, Jie Xu, Feng Gao, Konstanty Marszałek, and Artur Rydosz.
2020. "Influence of GLAD Sputtering Configuration on the Crystal Structure, Morphology, and Gas-Sensing Properties of the WO3 Films" Coatings 10, no. 11: 1030.
https://doi.org/10.3390/coatings10111030
APA Style
Zarzycki, A., Dyndał, K., Sitarz, M., Xu, J., Gao, F., Marszałek, K., & Rydosz, A.
(2020). Influence of GLAD Sputtering Configuration on the Crystal Structure, Morphology, and Gas-Sensing Properties of the WO3 Films. Coatings, 10(11), 1030.
https://doi.org/10.3390/coatings10111030