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Article

Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment

1
School of Electrical and Electronics Engineering, Chung-Ang University, Seoul 06974, Korea
2
Electronics and Telecommunications Research Institute (ETRI), Daejeon 34129, Korea
3
Department of Advanced Device Technology, Korea University of Science and Technology (UST), Daejeon 34113, Korea
4
School of Materials Science and Engineering, Georgia Institute of Technology (GIT), Atlanta, GA 30332, USA
5
Department of Electrical Engineering, Sejong University, Seoul 05006, Korea
*
Authors to whom correspondence should be addressed.
Coatings 2020, 10(11), 1026; https://doi.org/10.3390/coatings10111026
Received: 15 September 2020 / Revised: 10 October 2020 / Accepted: 20 October 2020 / Published: 25 October 2020
(This article belongs to the Special Issue Plasma Surface Engineering)
Work function tuning has a significant influence on the performance of semiconductor devices, owing to the formation of potential barriers at the interface between metal-semiconductor junctions. In this work, we introduce a technique for tuning the work function of ZnSnO thin films using high-density O2 plasma treatment. The work function and chemical composition of the ZnSnO thin film surfaces were investigated with regards to plasma treatment time through UPS/XPS systems. The optical band gap was estimated using Tauc’s relationship from transmittance data. The work function of Zn0.6Sn0.4O thin film increased from 4.16 eV to 4.64 eV, and the optical band gap increased from 3.17 to 3.23 eV. The surface of Zn0.6Sn0.4O thin films showed a smooth morphology with an average of 0.65 nm after O2 plasma treatment. The O2 plasma treatment technique exhibits significant potential for application in high-performance displays in optical devices, such as thin-film transistors (TFTs), light-emitting diodes (LEDs), and solar cells. View Full-Text
Keywords: zinc tin oxide; transparent conductive oxide; work function; O2 plasma; surface treatment; XPS; UPS zinc tin oxide; transparent conductive oxide; work function; O2 plasma; surface treatment; XPS; UPS
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MDPI and ACS Style

Joo, Y.-H.; Wi, J.-H.; Lee, W.-J.; Chung, Y.-D.; Cho, D.-H.; Kang, S.; Um, D.-S.; Kim, C.-I. Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment. Coatings 2020, 10, 1026. https://doi.org/10.3390/coatings10111026

AMA Style

Joo Y-H, Wi J-H, Lee W-J, Chung Y-D, Cho D-H, Kang S, Um D-S, Kim C-I. Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment. Coatings. 2020; 10(11):1026. https://doi.org/10.3390/coatings10111026

Chicago/Turabian Style

Joo, Young-Hee, Jae-Hyung Wi, Woo-Jung Lee, Yong-Duck Chung, Dae-Hyung Cho, Saewon Kang, Doo-Seung Um, and Chang-Il Kim. 2020. "Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment" Coatings 10, no. 11: 1026. https://doi.org/10.3390/coatings10111026

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