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Journal: Nanomaterials, 2019
Volume: 9
Number: 697

Article: Electrical Properties and Interfacial Issues of HfO2/Ge MIS Capacitors Characterized by the Thickness of La2O3 Interlayer
Authors: by Lu Zhao, Hongxia Liu, Xing Wang, Yongte Wang and Shulong Wang
Link: https://www.mdpi.com/2079-4991/9/5/697

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