Wang, M.; Guo, X.; Huang, Z.; Liao, M.; Liu, T.; Xu, M.
Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET. Nanomaterials 2026, 16, 145.
https://doi.org/10.3390/nano16020145
AMA Style
Wang M, Guo X, Huang Z, Liao M, Liu T, Xu M.
Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET. Nanomaterials. 2026; 16(2):145.
https://doi.org/10.3390/nano16020145
Chicago/Turabian Style
Wang, Meng, Xinlong Guo, Ziqiang Huang, Meicheng Liao, Tao Liu, and Min Xu.
2026. "Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET" Nanomaterials 16, no. 2: 145.
https://doi.org/10.3390/nano16020145
APA Style
Wang, M., Guo, X., Huang, Z., Liao, M., Liu, T., & Xu, M.
(2026). Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET. Nanomaterials, 16(2), 145.
https://doi.org/10.3390/nano16020145