Order Article Reprints

Shi C, Wang Y, Wang Z, Tian Y, Chen K, Li L, Chen X, Cai Y, Wang T. An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development. Nanomaterials. 2026; 16(12):726. https://doi.org/10.3390/nano16120726

Shi, Chao, Yixian Wang, Zimai Wang, Yumo Tian, Kuanlin Chen, Linyang Li, Xianhaoyan Chen, Yuan Cai, and Tuo Wang. 2026. "An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development" Nanomaterials 16, no. 12: 726. https://doi.org/10.3390/nano16120726

Shi, C., Wang, Y., Wang, Z., Tian, Y., Chen, K., Li, L., Chen, X., Cai, Y., & Wang, T. (2026). An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development. Nanomaterials, 16(12), 726. https://doi.org/10.3390/nano16120726