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Journal: Nanomaterials, 2026
Volume: 16
Number: 43
43
Article: Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions
Authors: by Jing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, Peng Gao, Yu Qiu, Yuqi Lin and Shui-Yang Lien
Link: https://www.mdpi.com/2079-4991/16/1/43

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