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Journal: Nanomaterials, 2025
Volume: 15
Number: 172
Article:
Demonstration of Integrated Quasi-Vertical DMOS Compatible with the Bipolar-CMOS-DMOS Process Achieving Ultralow RON,sp
Authors:
by
Feng Lin, Tuanzhuang Wu, Weidong Wang, Zhengxuan Wang, Yi Zhang, Sheng Li, Ran Ye, Long Zhang, Jiaxing Wei, Siyang Liu and Weifeng Sun
Link:
https://www.mdpi.com/2079-4991/15/3/172
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