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Journal: Nanomaterials, 2025
Volume: 15
Number: 172
172
Article: Demonstration of Integrated Quasi-Vertical DMOS Compatible with the Bipolar-CMOS-DMOS Process Achieving Ultralow R_ON,sp
Authors: by Feng Lin, Tuanzhuang Wu, Weidong Wang, Zhengxuan Wang, Yi Zhang, Sheng Li, Ran Ye, Long Zhang, Jiaxing Wei, Siyang Liu and Weifeng Sun
Link: https://www.mdpi.com/2079-4991/15/3/172

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