Park, W.-J.; Kim, H.-J.; Lee, J.-H.; Kim, J.-H.; Uhm, S.-H.; Kim, S.-W.; Lee, H.-C.
Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications. Nanomaterials 2024, 14, 1801.
https://doi.org/10.3390/nano14221801
AMA Style
Park W-J, Kim H-J, Lee J-H, Kim J-H, Uhm S-H, Kim S-W, Lee H-C.
Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications. Nanomaterials. 2024; 14(22):1801.
https://doi.org/10.3390/nano14221801
Chicago/Turabian Style
Park, Won-Ji, Ha-Jung Kim, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, So-Won Kim, and Hee-Chul Lee.
2024. "Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications" Nanomaterials 14, no. 22: 1801.
https://doi.org/10.3390/nano14221801
APA Style
Park, W.-J., Kim, H.-J., Lee, J.-H., Kim, J.-H., Uhm, S.-H., Kim, S.-W., & Lee, H.-C.
(2024). Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications. Nanomaterials, 14(22), 1801.
https://doi.org/10.3390/nano14221801
