Haslinger, M.J.; Maier, O.S.; Pribyl, M.; Taus, P.; Kopp, S.; Wanzenboeck, H.D.; Hingerl, K.; Muehlberger, M.M.; Guillén, E.
Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography. Nanomaterials 2023, 13, 1556.
https://doi.org/10.3390/nano13091556
AMA Style
Haslinger MJ, Maier OS, Pribyl M, Taus P, Kopp S, Wanzenboeck HD, Hingerl K, Muehlberger MM, Guillén E.
Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography. Nanomaterials. 2023; 13(9):1556.
https://doi.org/10.3390/nano13091556
Chicago/Turabian Style
Haslinger, Michael J., Oliver S. Maier, Markus Pribyl, Philipp Taus, Sonja Kopp, Heinz D. Wanzenboeck, Kurt Hingerl, Michael M. Muehlberger, and Elena Guillén.
2023. "Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography" Nanomaterials 13, no. 9: 1556.
https://doi.org/10.3390/nano13091556
APA Style
Haslinger, M. J., Maier, O. S., Pribyl, M., Taus, P., Kopp, S., Wanzenboeck, H. D., Hingerl, K., Muehlberger, M. M., & Guillén, E.
(2023). Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography. Nanomaterials, 13(9), 1556.
https://doi.org/10.3390/nano13091556