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Journal: Nanomaterials, 2023
Volume: 13
Number: 694

Article: All-Water-Driven High-k HfO2 Gate Dielectrics and Applications in Thin Film Transistors
Authors: by Fakhari Alam, Gang He, Jin Yan and Wenhao Wang
Link: https://www.mdpi.com/2079-4991/13/4/694

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