Yang, Y.; Zhu, X.; Ma, Z.; Hu, H.; Chen, T.; Li, W.; Xu, J.; Xu, L.; Chen, K.
Artificial HfO2/TiOx Synapses with Controllable Memory Window and High Uniformity for Brain-Inspired Computing. Nanomaterials 2023, 13, 605.
https://doi.org/10.3390/nano13030605
AMA Style
Yang Y, Zhu X, Ma Z, Hu H, Chen T, Li W, Xu J, Xu L, Chen K.
Artificial HfO2/TiOx Synapses with Controllable Memory Window and High Uniformity for Brain-Inspired Computing. Nanomaterials. 2023; 13(3):605.
https://doi.org/10.3390/nano13030605
Chicago/Turabian Style
Yang, Yang, Xu Zhu, Zhongyuan Ma, Hongsheng Hu, Tong Chen, Wei Li, Jun Xu, Ling Xu, and Kunji Chen.
2023. "Artificial HfO2/TiOx Synapses with Controllable Memory Window and High Uniformity for Brain-Inspired Computing" Nanomaterials 13, no. 3: 605.
https://doi.org/10.3390/nano13030605
APA Style
Yang, Y., Zhu, X., Ma, Z., Hu, H., Chen, T., Li, W., Xu, J., Xu, L., & Chen, K.
(2023). Artificial HfO2/TiOx Synapses with Controllable Memory Window and High Uniformity for Brain-Inspired Computing. Nanomaterials, 13(3), 605.
https://doi.org/10.3390/nano13030605