Shifat, A.S.M.Z.; Stricklin, I.; Chityala, R.K.; Aryal, A.; Esteves, G.; Siddiqui, A.; Busani, T.
Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution. Nanomaterials 2023, 13, 274.
https://doi.org/10.3390/nano13020274
AMA Style
Shifat ASMZ, Stricklin I, Chityala RK, Aryal A, Esteves G, Siddiqui A, Busani T.
Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution. Nanomaterials. 2023; 13(2):274.
https://doi.org/10.3390/nano13020274
Chicago/Turabian Style
Shifat, A. S. M. Zadid, Isaac Stricklin, Ravi Kiran Chityala, Arjun Aryal, Giovanni Esteves, Aleem Siddiqui, and Tito Busani.
2023. "Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution" Nanomaterials 13, no. 2: 274.
https://doi.org/10.3390/nano13020274
APA Style
Shifat, A. S. M. Z., Stricklin, I., Chityala, R. K., Aryal, A., Esteves, G., Siddiqui, A., & Busani, T.
(2023). Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution. Nanomaterials, 13(2), 274.
https://doi.org/10.3390/nano13020274